In the present study we have grown ZrC thin films using ion-beam sputtering technique for detailed structural and optical characterizations. Structural and optical properties are studied using several experimental techniques such as soft x-ray reflectivity (SXR), x-ray reflectivity (XRR), grazing incidence LY2409881 (GIXRD), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS) etc.
2. Experimental procedure
Thin films of ZrC of different thicknesses (100 Å, 200 Å and 300 Å) were deposited on Si (100) wafer using ion beam sputtering technique. Deposition was carried out under argon ambient at constant pressure of 6 × 10− 2 Pa. Prior to that a base pressure of 3 × 10− 5 Pa was achieved. A commercially available 4 in. sputtering target of ZrC (99.99% purity) was used. After process optimization, it was found that the films deposited at beam voltage of 1 kV and a gas flow rate of 3 standard cubic centimetres per minute are better in rms roughness.