Deposition mechanism Fig nbsp xA The

Fig. 9 shows the ATR-IR spectra of the coating deposited at temperatures ranging from 800 °C to 1200 °C. The spectra of the coating presented two broad bands which centered at approximately 1370 cm− 1 and 870 cm− 1, associated with the B–N and Si–N stretching vibrations respectively, according to Takashi Sugino [20] and A. Essafti [21]. In references [20] and [21], the spectra of pure BN films and pure Si3N4 films were 1380 cm− 1 and 860 cm− 1 respectively. However, the Si–B–N ternary co-deposition would cause XL765 shift of both the two spectra. In the present work, the spectra of B–N showed a 10 cm− 1 right-shift and the spectra of Si–N showed a 10 cm− 1 left-shift. No absorption bonds such as B–H or N–H were observed, indicating the completion of decomposition [11]. The IR spectra results also demonstrated the deposition process controlled by BCl3 + NH3 and by SiCl4 + NH3 reactions. Therefore, the SiBN coating should be a uniform and amorphous compound, which is composed of very small Si–N particle and B–N particle according to XRD, XPS and ATR-IR results.