In this Ro 31-8220 article an efficient method for the three-dimensional computation of the layer thickness in electrophoretic deposition processes has been introduced. Therein the effects of the layer thickness on the electric field could be described by a Robin-type boundary condition. An enamel coating process served as a model process for the validation of the mathematical model. The thickness of the layer was measured magnetically.
The described model was applied for the optimization of the layer thickness distribution under the constraint hypertonic the minimum layer thickness had to be higher than a given value. It has been shown that a segmented counter electrode can be used to decrease the mean layer thickness on the workpiece. It turned out that an adaption of the potential differences is more efficient than an adaption of the coating times of the counter electrodes. For the given test case the mean layer thickness could be decreased by 10.5%, which corresponds to an optimisation gain of 44.1%.