Fig. 13. Optimized reactive magnetron sputtering configuration using two Si–B and Nb cathodes and closed-loop control of target voltage (VT) of GSK1324726A emission or both.Figure optionsDownload full-size imageDownload high-quality image (117 K)Download as PowerPoint slide
The accuracy of process control can also be improved further by using optical plasma monitoring (often termed as Plasma Emission Monitoring [PEM]) as a feedback signal instead of VT alone, providing a substantially wider process window – and thus higher control accuracy – or by a combination of both, as for example has been reported in ref. .